Point-of-use photochemical filter with superior contaminant retention and low hold-up volume performance in sub-10 - 180 nm technology nodes.

• Cost-effective, scalable and convenient alternative for testing and particle evaluation of process chemicals
• Optimized filter improves filtration of photoresists and other process chemicals without releasing retained particles back into the process
• No prewetting required for UPE membrane reduces the potential sources of microbubble formation and avoids problems associated with incomplete wetting and the mixing of incompatible chemicals
  
  
  在亞10 - 180納米技術(shù)節(jié)點(diǎn)中，使用點(diǎn)光化學(xué)過(guò)濾器具有卓越的污染物截留和低滯留體積性能。用于工藝化學(xué)品測(cè)試和顆粒評(píng)估的經(jīng)濟(jì)、可擴(kuò)展且方便的替代方案優(yōu)化的過(guò)濾器改善了光刻膠和其他工藝化學(xué)品的過(guò)濾，而不會(huì)將殘留顆粒釋放回工藝中UPE膜不需要預(yù)潤(rùn)濕減少了微氣泡形成的潛在來(lái)源，并避免了與不完全潤(rùn)濕和不相容化學(xué)品混合相關(guān)的問(wèn)題